Technology transfers

To develop and run the facility, a very large field of technologies are used at GANIL, most of them at the forefront of progress.

GANIL has already transferred several technologies by licensing and patenting.

ECR ion sources

5 patents (CEA and CNRS as signatories) in 1991, 1996, 1996, 2008, 2010

Creation of the PANTECHNIK company in 1991 (GANIL spin-off)

Patent license agreement with PANTECHNIK for these 5 patents

Beam profile monitors

Secondary electron emission beam profile monitors:  technology transfer towards PANTECHNIK company (distributed in 2019) 

Mechanical manufacturing

1 patent under validation process for aluminium flanges